Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool

We examined the synthesis, physical properties, and resist properties of various iodine-containing molecules polymers as materials. By condensation reaction 2,6-dimethylphenol (DMP) with 4-iodebenzaldehyde (IBA), 3,5-diiodesalicylaldehyde (DISA) 4-hydroxy-3,5-diiodebenzaldehyde (HDIA), corresponding iodine containing compounds DIPM, 2-DIPM, 4-DIPM were synthesized. The these adamantyl bromo acetate, yielding adamanty ester groups DIPM-AD, 2-DIPM-AD, 4-DIPM-AD. polyaddition divinyl ethers such diethylene glycol ether (DGDE), 1,4-bis(allyloxymethyl)cyclohexane (BAC), 2,2'-bis(4-vinyloxyethoxyphenyl)perfluoropropane (BVFP) was investigated to give hyperbranched polyacetals poly(4-DIPM-co-DGDE), poly(4-DIPM-co-BAC), poly(4-DIPM-co-BVFP). In same way, tri(4-hydoroxyphenyl)methane (THM) used instead 4-DIPM, poly(THM-co-DGDE), poly(THM-co-BAC), poly(THM-co-BVFP) also Almost all materials had good (solubility, film formation, high thermal stability,) excellent thickness loss property. sensitivity in extreme ultraviolet (EUV) exposure tool showed that candidate offer higher resolution pattern, i.e., E0 = 7.0 mJ/cm2 for 2.0 4-DIPM-AD, poly(THM-co-DGDE) 1.0 poly(4-DIPM-co-DGDE) poly(4-DIPM-co- BVFP).